A simple protocol for the fabrication of three-dimensional (3D) photonic crystals in silicon is presented. Surface structuring by nanosphere lithography is merged with a novel silicon etching method to fabricate ordered 3D architectures. The SPRIE method, sequential passivation reactive ion etching, is a one-step processing protocol relying on sequential passivation and reactive ion etching reactions using C4F8 and SF6 plasma chemistries.